°øÁö»çÇ×

¾Ë¸²¸¶´ç °øÁö»çÇ×
Á¦11ȸ Ç¥¸éºÐ¼®½ÉÆ÷Áö¾ö °³ÃÖ ¾È³»
ÀÛ¼ºÀÚ
°ü¸®ÀÚ
ÀÛ¼ºÀÏ
2015-10-05
Á¶È¸
4006

Á¦11ȸ Ç¥¸éºÐ¼®½ÉÆ÷Áö¾öÀÌ 10/6(È­)-8(¸ñ)±îÁö º¯»ê ´ë¸í¸®Á¶Æ®¿¡¼­ ¿­¸³´Ï´Ù.
°ü½ÉÀÖ´Â ºÐµéÀÇ ¸¹Àº Âü¿© ¹Ù¶ø´Ï´Ù
.

http://kossa.kriss.re.kr/

ÁÖ¿äÀÏÁ¤
6/1-8/3
ÃÊÃËÁ¢¼ö
6/1-8/31
»çÀüµî·Ï
9/14-30
¼÷¹Ú¿¹¾à


10¿ù 6ÀÏ (È­) - Surface Analysis Tutorial
13:30 ~ 14:30 ±èÁ¤¿ø (Çѱ¹Ç¥ÁØ°úÇבּ¸¿ø)
Ç¥¸éºÐ¼® °³·Ð
14:30 ~ 15:30 Àüöȣ (Çѱ¹±âÃÊ°úÇÐÁö¿ø¿¬±¸¿ø)
ARPES ¿ø¸® ¹× ÀÀ¿ë
Coffee Break (15:30 ~ 15:50)
15:50 ~ 16:50 ÀÌ¿¬Èñ (Çѱ¹°úÇбâ¼ú¿¬±¸¿¬±¸¿ø)
TOF-SIMSÀÇ ¿ø¸® ¹× ÀÀ¿ë
16:50 ~ 17:50 À̺ÀÈ£ (´ë±¸°æºÏ°úÇбâ¼ú¿ø)
APTÀÇ ¿ø¸® ¹× ÀÀ¿ë
17:50 ~ 18:00 Ç¥¸éºÐ¼® Q&A, ¸¶¹«¸®


 
10¿ù 7ÀÏ (¼ö)
Session 1: Secondary Ion Mass Spectrometry
09:00-09:30 Hiroto Itoh (Konica Monolta)
Practical Surface Chemical Analysis of Organic Materials using TOF-SIMS
09:30-10:00 ±èÁö°æ (»ï¼ºÀüÀÚ)
On pattern SIMS analysis techniques on semiconductor devices
10:00-10:20 Á¤¼®¿ø (LGÀüÀÚ)
Application of TOF-SIMS for electronic material: 2D and 3D imaging techniques
Session 2: Electron Spectroscopy
10:40-11:10 (ÃÊû) Noriko Ishizu (Okinawa Institute of Science & Technology)
Depth-Profiling Working Group in Surface Analysis society of Japan
11:10-11:40 (ÃÊû) ȲÂù±¹ (Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò)
Making graphene-based, layered heterostructures and their electronic structures
11:40-12:10 (ÃÊû) ¹Ú¿ë¼· (°æÈñ´ëÇб³)
Energy level alignment in polymer organic solar cells at donor-acceptor planar junction formed by electrospray vacuum deposition
12:10-12:30 Risayo Inoue (ULVAC-PHI)
Fundamental Application of Laboratory Hard X-ray Photoelectron Spectroscopy being under development
Lunch (12:30-13:30)
Session 3: Imaging Technology (APT µî)
13:30-14:00 (ÃÊû) ¼³À纹 (Æ÷Ç×°ø°ú´ëÇб³)
Atom probe tomographyÀÇ È°¿ëÀ» À§ÇÑ Á¶¾ð: ºÐ¼®Á¶°Ç, µ¥ÀÌÅÍ Ã³¸® ¹× artifacts
14:00-14:30 (ÃÊû) ½Åäȣ (Çѱ¹Ç¥ÁØ°úÇבּ¸¿ø)
Fast, exact, and non-destructive diagnoses in nano-scale semiconductor device using conductive AFM
14:30-14:50 ÀÌÁö¿µ (Çѱ¹°úÇбâ¼ú¿¬±¸¿ø)
Charge and discharge characteristics of Li(NiCoMo)O2 cathode revealing by atom probe
Coffee Break (15:00-15:20)
Session 4: Novel Technology
15:10-15:40 (ÃÊû) ±èÀ翵 (´ë±¸°æºÏ°úÇбâ¼ú¿ø)
»ì¾ÆÀÖ´Â ¼¼Æ÷¿Í Á¶Á÷À» ºÐ¼®Çϱâ À§ÇÑ ´ë±â¾Ð Áú·®ºÐ¼® À̹Ì¡ ±â¼ú
15:40-16:10 (ÃÊû) Á¶»óÈñ (Çѱ¹Ç¥ÁØ°úÇבּ¸¿ø)
Probing the structural disorder of epitaxial graphene using scanning thermoelectric microscopy
16:10-16:30 ±èö±â (¾Æ¹ÌÅØÄÚ¸®¾Æ)
Introduction of high quality papers produced by using single and combination of surface analytical solutions
Poster Session (16:30 ~ 18:00)
Banquet (18:30 ~ 20:00)


 
10¿ù 8ÀÏ (¸ñ)
Session 5: Application 1 (Bio & organic)
09:00-09:30 (ÃÊû) °­¼ºÈ£ (°æÈñ´ë)
Fluorescent-free super-resolution nanoscopy based on enhanced dark-field illumination of specific localized surface plasmon resonance wavelengths
09:30-10:00 (ÃÊû) À§Á¤¼· (Çѱ¹Ç¥ÁØ°úÇבּ¸¿ø)
³ª³ë°øÁ¤±â¼ú ±â¹Ý ¹ÙÀÌ¿ÀÀ̹Ì¡/¼¾¼­ ¿¬±¸
Coffee Break (10:00-10:20)
Session 6: Application 2 (Semiconductor & metal)
10:20-10:50
(ÃÊû) Á¶¼ºÂù (»ï¼ºµð½ºÇ÷¹ÀÌ)
Applications of Nano-Scale SIMS (Secondary Ion Mass Spectroscopy) to Display Devices Technology
10:50-11:20
(ÃÊû) Çã ¼º (»ï¼ºÀüÀÚ)
Band gap profile of Cu(In,Ga)(Se,S)2 thin films via high-resolution reflection electron energy loss spectroscopy
11:20-11:50 (ÃÊû) Ãֹαâ (SK ÇÏÀ̴нº)
XPS/REELS¸¦ ÀÌ¿ëÇÑ ´ÙÃþ À¯Àü¸· ¹ÝµµÃ¼ ±¸Á¶¿¡¼­ÀÇ Band Alignment ºÐ¼®
11:50-12:10 ±èÈ«¸é (¾Æ¹ÌÅØÄÚ¸®¾Æ)
Technique and instruction to maintain M-SIMS and Atom Probe at optimum condition for performance enhancement
Closing (12:00-12:30)